A method for reducing skin is disclosed, in which a plurality of incisions or removals are made to collectively form a patch of skin to be reduced, instead of making a single large treatment of the patch. Thus, scarring after healing is less noticeable. Preferably, the treated regions of skin are arranged such that a total area of all removed skin segments taken in a direction perpendicular to an axis of said patch changes gradually along said axis. The removed regions of skin are preferably navicular in shape, and the patches are preferably navicular in shape in the event an elongated incision is made. The removal of skin regions can be realized by proper treatment methods such as incisions and laser treatment. The mask may be attached to the patch of skin to be treated after said skin is stretched.
