A cleansing composition free of sulfate, parabens, and silicone is described.The cleansing composition includes an anionic surfactant having weight percentage in the range of 0.5-18%, an amphoteric surfactant having weight percentage in the range of 0.5- 7%, a non-ionic surfactant having weight percentage in the range of 0.1-15%, and a polymer having weight percentage in the range of 0.1-5%. A w/w ratio of the amphoteric surfactant to the anionic surfactant in the cleansing composition is in the range of 1:1.5-1:4. Further, a w/w ratio of the amphoteric surfactant to the non-ionic surfactant in the cleansing composition is in the range of 1:0.4-1:2.
