One aspect of the present invention comprises a nail polish removing composition that is essentially free of acetone and ethyl acetate, and is essentially free of odor. The composition includes at least one triester of glycerol and C2-C5 carboxylic acid, at least one C3-C5 glycol, at least one C4-C6 cyclic carbonate, and, optionally, at least one colorant. Another aspect of the present invention is a method of removing nail polish, comprising providing the nail polish removing composition； immersing an absorbent material in the composition, wherein the absorbent material absorbs the composition； contacting the absorbent material to nail polish for a time sufficient to plasticize the nail polish film； and removing the plasticized nail polish film by mechanically rubbing with the absorbent material, wherein the composition comprises one or more phases.
