COMPOSE PRECURSEUR MARQUE AU FLUOR RADIOACTIF, ET PROCEDE DE PRODUCTION D'UN COMPOSE MARQUE AU FLUOR RADIOACTIF UTILISANT CE DERNIER

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专利权人:

NIHON MEDI-PHYSICS CO., LTD.;TOKYO INSTITUTE OF TECHNOLOGY

发明人:

KIRIU, MASATO,ICHIKAWA, HIROAKI,OKUMURA, YUKI,TANAKA, HIROSHI

申请号：

CA3055417

公开号：

CA3055417A1

申请日:

2018.03.05

申请国别(地区):

CA

年份:

2018

代理人:

摘要：

Provided is a labeled precursor compound represented by formula (2). (In the formula, S represents a substrate, L represents a C1-6 linear alkyl group which may contain an ether group, R1 and R2 each independently represent a C1-30 linear or branched alkyl group, or a substituted or unsubstituted monocyclic or fused polycyclic aryl group, each R3 independently represents a C1-4 alkyl group or a C1-4 alkoxy group, and p represents an integer of 0 to 4.)

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