High-purity quinoline derivative and method for manufacturing same

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专利权人:

Ltd.;Eisai R&D Management Co.

发明人:

Nakamura, Taiju,Abe, Taichi,Miyashita, Yusuke,Kuroda, Hirofumi,Ayata, Yusuke,Akao, Atsushi

申请号：

AU2015309862

公开号：

AU2015309862A1

申请日:

2015.08.26

申请国别(地区):

AU

年份:

2017

代理人:

摘要：

Provided is a compound represented by formula (IV) or a salt thereof, said compound containing no more than 350 mass ppm of the compound represented by formula (I).

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/