POSITIVELY CHARGED ARYL AND HETEROARYL ACETIC ACID PRODRUGS WITH HIGH SKIN PENETRATION RATE
- 专利权人:
- 发明人:
- 申请号：
- HK14110297.3
- 公开号：
- HK1196823A
- 申请日:
- 2014.10.15
- 申请国别(地区):
- HK
- 年份:
- 2014
- 代理人:
- 摘要：
- 来源网站：
- 中国工程科技知识中心
相关发明人
相关专利
- POSITIVELY CHARGED WATER-SOLUBLE PRODRUGS OF N-ARYLANTHRANILIC ACIDS WITH VERY FAST SKIN PENETRATION RATE
- POSITIVELY CHARGED ARYL AND HETEROARYL ACETIC ACID PRODRUGS WITH HIGH SKIN PENETRATION RATE
- POSITIVELY CHARGED WATER-SOLUBLE PRODRUGS OF N-ARYLANTHRANILIC ACIDS WITH VERY FAST SKIN PENETRATION RATE
- POSITIVELY CHARGED WATER-SOLUBLE PRODRUGS OF N-ARYLANTHRANILIC ACIDS WITH VERY FAST SKIN PENETRATION RATE
- POSITIVELY CHARGED WATER-SOLUBLE PRODRUGS OF ACETAMINOPHEN AND RELATED COMPOUNDS WITH VERY FAST SKIN PENETRATION RATE
