Die Erfindung betrifft eine Anlage zur Behandlung von Oberflächen, insbesondere zur kathodischen Tauchlackierung, mit zumindest einem Kreislauf für eine insbesondere wässrige Prozessflüssigkeit (12) und Anolytlösung (28), welcher wenigstens eine Desinfektionsvorrichtung (22) zum Sterilisieren der Prozessflüssigkeit umfasst, wobei die Desinfektionsvorrichtung (22) als UV-Lichtquelle (22) ausgebildet ist.The system comprises a circuit for an aqueous process liquid, and an anolyte solution, where the circuit includes a disinfecting device for sterilizing the process liquid. The disinfecting device is formed as a UV light source (22). The UV light source: emits UV light in a wavelength of 1-300 nm is arranged to a support for an UV-resistant dialysis membrane (18) of a dialysis cell (14) of the system and is spaced from the carrier for the dialysis membrane, where a first light guide (26) for guiding a light from the UV light source is provided to the carrier. The system comprises a circuit for an aqueous process liquid, and an anolyte solution, where the circuit includes a disinfecting device for sterilizing the process liquid. The disinfecting device is formed as a UV light source (22). The UV light source: emits UV light in a wavelength of 1-300 nm is arranged on a support for an UV-resistant dialysis membrane (18) of a dialysis cell (14) of the system and is spaced from the support for the dialysis membrane, where a first light guide (26) for guiding a light from the UV light source is provided to the support. The support has a plate-shaped second light guide (24) for guiding the light from the UV light source or the first light guide for the dialysis membrane. A light exit side of the second light guide lies in the operation of the system below a liquid level (16) of the process liquid and the anolyte solution in the dialysis cell.
