#$%^&*AU2014200574A120141002.pdf#####ABSTRACT A system (500) and method is presented for performing optical measurements, including a light source (510) configured to emit a light beam (511), a first pattern generator (520) defining a first longitudinal axis and configured to project a first generated pattern (562), and a second pattern generator (530) defining a second longitudinal axis and configured to project a second generated pattern (564). The first and second generated patterns have different angular divergency (a and b). The first pattern generator (520) is a diffractive circle pattern generator (520), whereas the second pattern generator (530) is a diffractive cross pattern generator (530). Adjustment of the first and second generated patterns (562 and 564) with respect to each other cause the system (500) to serve as an optical ruler for performing the optical measurements when the first and second generated patterns (562 and 564) overlap or coincide with each other at certain points.1/8 10 122 120 104116 00< 6 .... *- 106 102 c di d2 Fig. 1 d Fig 2 116
