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HYDROGEN SUIT FOR SKIN EXPOSURE
专利权人:
Microlin; LLC.
发明人:
Ashok V. Joshi,Jeremy Heiser
申请号:
US13888081
公开号:
US20130296768A1
申请日:
2013.05.06
申请国别(地区):
US
年份:
2013
代理人:
摘要:
A system facilitates creating a controlled hydrogen rich environment around a patient. The system includes an enclosure, at least one opening, and a hydrogen source. The enclosure forms an internal space to at least partially enclose a body part of the patient. The opening is defined within the enclosure to allow a portion of the body part of the patient to extend out of the internal space of the enclosure. The opening is further configured to form a seal around the body part that extends out of the internal space of the enclosure. The hydrogen source delivers hydrogen gas into the internal space of the enclosure.
来源网站:
中国工程科技知识中心
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