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SYSTEM AND METHOD FOR MONITORING PHOTOTOXICITY DURING OPHTHALMIC SURGERY
专利权人:
Novartis AG
发明人:
Gerald David Bacher,Mark David Labelle
申请号:
US15820824
公开号:
US20180147087A1
申请日:
2017.11.22
申请国别(地区):
US
年份:
2018
代理人:
摘要:
The present disclosure provides a system and method for monitoring phototoxicity caused by vitreous visualization device (“VVD”) illumination during ophthalmic surgery. The systems and methods determine the cumulative amount of optical energy incident on the retina, which corresponds to phototoxicity, the distance between a cutter of the VVD and the retina, and areas where the vitreous has been removed, or any combination thereof. The disclosure further provides a method for monitoring and preventing phototoxicity caused by VVD illumination during ophthalmic surgery. The method may further include determining the distance between a cutter of the VVD and the retina, and determining areas where the vitreous has been removed based on focus areas of the retina that the plurality of light spots has contacted.
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