Tiffany E. Miller,Daniel M. Storey,Barbara S. Kitchell
申请号：
US13564088
公开号：
US20130053938A1
申请日:
2012.08.01
申请国别(地区):
US
年份:
2013
代理人:
摘要：
A molecular plasma deposition (MPD) method in combination with an atomic layer deposition (ALD) procedure is used to produce amorphous, nonconformal thin metal film coatings on a variety of substrates. The films are porous, mesh-like lattices with imperfections such as pinholes and pores, which are useful as scaffolds for cell attachment, controlled release of bioactive agents and protective coatings.
