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Wavefront analysis inspection apparatus and method
专利权人:
Elie Meimoun
发明人:
Elie Meimoun
申请号:
US13254845
公开号:
US08928892B2
申请日:
2010.03.03
申请国别(地区):
US
年份:
2015
代理人:
摘要:
The present invention provides high-resolution wavefront measurement systems and methods for real-time inspection of optical and geometrical properties of specular and transparent objects, the systems of the invention comprising at least one illumination apparatus, at least one imaging apparatus constructed and configured to image the object onto an image plane, at least one gradient element disposed at one of the aperture stops of the imaging apparatus and a sensor placed in the image plane of the imaging apparatus, wherein the sensor is capable of differentiating between different areas of the gradient element thereby being adapted to provide real-time optical and geometrical data of the object.
来源网站:
中国工程科技知识中心
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http://www.ckcest.cn/home/

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