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BEAM PROFILE MEASUREMENT SYSTEM
专利权人:
ACCURAY INCORPORATED
发明人:
Jonathan McCoy,Atsushi Mitsuishi,Hidetaka Koga,Kazuyuki Kobayashi,Shigemi Ogawa,Tadashi Otani
申请号:
US15446170
公开号:
US20180250526A1
申请日:
2017.03.01
申请国别(地区):
US
年份:
2018
代理人:
摘要:
A beam profile measurement (BPM) system is described including a BPM phantom including a tank to house liquid, a dosimeter disposed in the tank to detect ionization of a radiation beam emitted from a linear accelerator (LINAC), and a positioning device to move the dosimeter in a vertical direction. The BPM system also includes a BPM controller to operably couple to the BPM phantom and the LINAC. A method is described including positioning, using a BPM controller, a dosimeter of the BPM phantom in a first location, positioning, using the BPM controller, the LINAC in a second location, performing, using the BPM controller, a first movement of the LINAC from the second location to a third location, emitting a radiation beam from the LINAC during the first movement, and performing, via the dosimeter, an ion measurement of the radiation beam during the emitting.
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