Higgins, Brian Sayre,Tate III, John Marshall,Yates, Robert Arthur,Pomerleau, Marcel Julien,Heon, Jon Michael,Dirkx, Wilfried Marc Renaat,Coloma González, Juan
申请号：
AU20170262812
公开号：
AU2017262812(A1)
申请日:
2017.05.09
申请国别(地区):
澳大利亚
年份:
2018
代理人:
摘要：
Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
