Method include using an apparatus to measure a first surface field, at a first surface of the apparatus, of an artifact having one or more surface features with known topography. The method includes determining a first focus metric at the first surface based on at least a portion of a first surface profile containing the one or more surface features. Methods include digitally transforming, the first surface field into a second surface field at a second surface of the apparatus, deriving, a second surface profile from the second surface field and computing a second focus metric for the second surface profile, and determining, based on two or more focus metric values, an optimum surface for evaluating the instrument transfer function. Method include determining the instrument transfer function of the apparatus based on at least a portion of the surface profile derived from the surface field of the optimum surface.
