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Nanostructures fabricated by metal assisted chemical etching for antibacterial applications
专利权人:
International Business Machines Corporation
发明人:
Stacey M. Gifford,Huan Hu,Pablo M. Rojas,Gustavo A. Stolovitzky
申请号:
US14973984
公开号:
US10292384B2
申请日:
2015.12.18
申请国别(地区):
US
年份:
2019
代理人:
摘要:
The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.
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