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Photodamage mitigation compounds and systems
专利权人:
Stephen Yue
发明人:
Stephen Yue,Robert Weber,Xiangxu Kong,Andrei Fedorov,John Lyle
申请号:
US13208151
公开号:
US08834847B2
申请日:
2011.08.11
申请国别(地区):
US
年份:
2014
代理人:
摘要:
Compositions, devices, systems and methods for reducing and/or preventing photo-induced damage of one or more reactants in an illuminated analytical reaction by addition of one or more photoprotective compounds to the reaction mixture and allowing the reaction to proceed for a period that is less than a photo-induced damage threshold period.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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