Kim Yeonok,Park Seok-Bong,Choi Gyung-Sik,Lee Su Min
申请号：
US201615774426
公开号：
US2018321535(A1)
申请日:
2016.09.28
申请国别(地区):
美国
年份:
2018
代理人:
摘要：
The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.
