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プロセスガス分流供給装置
专利权人:
CKD株式会社
发明人:
上原 正人,土居 広樹
申请号:
JP20130023656
公开号:
JP6085492(B2)
申请日:
2013.02.08
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To feed process gas to many process gas feeder devices installed at far locations through one unit of process gas diversion supply device.SOLUTION: This invention has some features that an inlet valve 13A comprises a main body block 34 having a valve seat 22 to which a diaphragm valve body 21 is abutted or spaced away, a valve chamber 23, an input flow passage 24 to which gas flows in, a first output flow passage 25 where gas always flows out and a second output flow passage 30 from which gas flows out while the diaphragm valve body 21 is spaced away from the valve seat 22, that the input flow passage 24 and the first output flow passage 25 have a communicating part 26 just below the valve seat 22, that an input port 24a of the input flow passage 24, a first output port 25a of the first output flow passage 25 and a second output port 30a of the second output flow passage 30 are arranged in one line at the lower surface of the main body block 34 and that a port of the second output flow p
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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