Compress for Relief from Radiation Treatments

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专利权人:

Natasha Polster

发明人:

Natasha Polster

申请号：

US16826262

公开号：

US20200297527A1

申请日:

2020.03.22

申请国别(地区):

US

年份:

2020

代理人:

摘要：

A compress for treating and preventing radiation dermatitis, comprising a reservoir layer configured to store and release a mixture of skin-cooling ingredients, wherein the compress is cold before applying to skin exposed to radiation therapy or becomes cold after applying to skin exposed to radiation therapy.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/