Pochodna kwasu hydroksamowego

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专利权人:

Ltd.;FUJIFILM Toyama Chemical Co.

发明人:

TAKASHIMA, HAJIME,TSURUTA, RISA,YABUUCHI, TETSUYA,OKA, YUSUKE,URABE, HIROKI,SUGA, YOICHIRO,TAKAHASHI, MASATO,UNEUCHI, FUMITO,KOTSUBO, HIRONORI,SHOJI, MUNEO,KAWAGUCHI, YASUKO

申请号：

PL11772045

公开号：

PL2562155T3

申请日:

2011.04.20

申请国别(地区):

PL

年份:

2019

代理人:

摘要：

Provided is a novel compound which is useful as a pharmaceutical composition by inhibiting an LpxC activity, thereby exhibiting potent antimicrobial activity against gram-negative bacteria including Pseudomonas aeruginosa and its drug resistant bacteria. Provided is a hydroxamic acid derivative represented by the following general formula [1] or a pharmaceutically acceptable salt thereof:

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/