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DISPOSITIF ET SYSTÈME POUR MESURES INDIVIDUELLES D'EXPOSITION AUX UV
专利权人:
L'Oréal
发明人:
SHI, Yunzhou,PIELAK, Rafal,BALOOCH, Guive
申请号:
EP17736221
公开号:
EP3400062A4
申请日:
2017.01.04
申请国别(地区):
EP
年份:
2020
代理人:
摘要:
A system is provided for determining personal ultra-violet (UV) radiation measurements, comprising: a measurement device configured to measure UV irradiation; and a terminal device configured to receive or capture an output of the measured UV irradiation from the measurement device and to determine a specific user's personal UV exposure risk level based on at least the measured sun irradiation and information of a skin type of the specific user. The measurement device configured to measure UV radiation exposure includes a surface that includes a plurality of different sections that each have a different sensitivity to UV radiation exposure, and each of the plurality of different sections are configured to display a different color in response to the UV radiation exposure.
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中国工程科技知识中心
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http://www.ckcest.cn/home/

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