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Method for patterned plasma-mediated modification of the crystalline lens
专利权人:
Optimedica Corporation
发明人:
William Culbertson,Barry Seibel,Neil Friedman,Georg Schuele,Phillip Gooding
申请号:
US14576467
公开号:
US09968439B2
申请日:
2014.12.19
申请国别(地区):
US
年份:
2018
代理人:
摘要:
A system for treating a cataractous lens of a patient's eye includes a laser source for generating a light beam, a scanning system for deflecting the light beam to form a treatment pattern of the light beam, and a controller operably coupled to the laser source and scanning system and configured to operate the scanner to form the treatment pattern. The treatment pattern is a plurality of cuts in the form two or more different incision patterns for segmenting the lens tissue into a plurality of patterned pieces. The incision pattern includes: a first incision pattern including two or more crossing cut incision planes; and a second incision pattern comprising one or more laser incision each extending along a first length between a posterior and an anterior surface of the lens capsule.
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