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基板の再利用方法及び基板洗浄装置
专利权人:
大陽日酸株式会社
发明人:
小野 宏之,山脇 正也,安達 啓輔
申请号:
JP20130106985
公开号:
JP6108453(B2)
申请日:
2013.05.21
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a substrate reuse method that enables a residue remaining on a surface of a substrate from which CNT has been peeled to be easily removed and that enables the substrate to be reused for a new CNT synthesis.SOLUTION: The substrate reuse method is configured to reuse a substrate obtained through a step of synthesizing a CNT using a substrate in which a catalyst layer made of catalyst metal is deposited on a smooth base plate and a step of peeling the CNT from the substrate surface. The method includes a step of bringing the substrate processed in the above steps into a high temperature furnace 2, a step of introducing a first cleaning gas containing oxygen gas into the high temperature furnace 2 and then heating the substrate to remove compounds containing carbon on the substrate surface, and a step of introducing a second cleaning gas containing a chlorine-based gas into the high temperature furnace 2 and then heating the substrate to remove compounds containing metal on the su
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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