Robert Bismuth,William D. Orner,Jacob Rapoport,Amit Rohatgi
申请号：
US14442707
公开号：
US09791267B2
申请日:
2015.05.12
申请国别(地区):
US
年份:
2017
代理人:
摘要：
Embodiments of a shape measurement system and related methods are disclosed. In some embodiments, the system places a two-dimensional initial pattern, which can be implemented as a standalone molding or can be attached to a light source or printed on an outfit, onto a surface of a three-dimensional object. The system captures a transformed version of the initial pattern in two dimensions that is distorted due to the varying depth of the surface. The system then analyzes the transformed pattern and derives three-dimensional information regarding the target object. The analysis, which can incorporate a calibration process, can rely on the projection nature of the light source, the isomorphism/non-isomorphism of the initial pattern, and other factors.
