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DISPOSITIF D'IRRADIATION DE GAZ ACTIF
专利权人:
Ltd.;Sekisui Chemical Co.
发明人:
申请号:
EP18851245.3
公开号:
EP3677306A1
申请日:
2018.08.31
申请国别(地区):
EP
年份:
2020
代理人:
摘要:
The present invention provides a reactive gas application apparatus capable of easily and surely applying a reactive gas to a target object. The reactive gas application apparatus (100) includes: a plasma generating unit (12), a nozzle (1) for discharging a reactive gas activated by plasma generated in the plasma generation unit (12), and a light source unit (50) for emitting light toward a position ahead of a tip of the nozzle (1). The reactive gas application apparatus preferably further includes a control unit for synchronizing plasma generation in the plasma generation unit and light emission in the light source unit.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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