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Li She Line Sweep retouches irradiation Xi System
专利权人:
三菱电机株式会社;MITSUBISHI ELECTRIC CORPORATION;三菱電機株式會社
发明人:
蒲越虎,池田昌广,池田昌廣,本田泰三
申请号:
MOJ003045
公开号:
MOJ003045B
申请日:
2018.04.13
申请国别(地区):
MO
年份:
2018
代理人:
摘要:
The bright Ti Gong mono- Seed Li She Line Sweep of this Hair retouches illuminating method,Bao includes Ru Xia Bu Sudden: root According and controls the phase Right Li She Line exposure and the side Office Li She Line Elixirs amount that Treatment Meter Row is determined by Li She Line,Find out the Meter Row irradiation particle Number Bu Sudden of each Zhao She Dot of Li She Line; Root According Meter Row irradiates the Zhao She Over journey of the Li She Line of beam Electricity stream each Zhao She Dot of waveform Come Mo Be of particle Number and Li She Line,It finds out and retouches the particle Number Bu Sudden for moving Move Qi Inter and being irradiated to affected part in Li She Line Sweep; The particle Number that shifting Move Qi Inter irradiates is retouched using in Sweep,Correct the Meter Row irradiation particle Number Bu Sudden of each Zhao She Dot; The Meter Row irradiation particle Number Change of Will correction Hou is counted as the Meter Number value Bu Sudden of Elixirs Liang Prison control device; And the Meter Number value Come irradiation Li She Line Bu Sudden that Gen According Change is obtained.本發明提供一種粒子射綫掃描照射方法,包括如下步驟:根據由粒子射綫治療計劃决定的相對粒子射綫照射量及處方粒子射綫劑量,求出粒子射綫的各照射點的計劃照射粒子數的步驟;根據計劃照射粒子數及粒子射綫的射束電流波形來模擬各照射點的粒子射綫的照射過程,求出在粒子射綫掃描移動期間照射到患部的粒子數的步驟;使用在掃描移動期間照射的粒子數,校正各照射點的計劃照射粒子數的步驟;將校正後的計劃照射粒子數換算成劑量監控器的計數值的步驟;以及根據換算得到的計數值來照射粒子射綫的步驟。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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