A cleansing agent composition containing (A) a sulfonate-type surfactant and/or a sulfate-type anionic surfactant, and (B) a heterocyclic compound represented by the formula (1) wherein R 1 and R 2 are each independently a hydrogen atom, a methyl group, a hydroxymethyl group, or a hydroxyethyl group, shows high detergency and low irritativeness, can suppress rough skin after washing and drying, and can be preferably used for cosmetic agents.
