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Plasma generation system and plasma generation method
专利权人:
Takehiko Sato;Tatsuo Kimura;Tatsuyuki Nakatani
发明人:
Takehiko Sato,Tatsuyuki Nakatani,Tatsuo Kimura
申请号:
US11992007
公开号:
US08168130B2
申请日:
2006.08.11
申请国别(地区):
US
年份:
2012
代理人:
摘要:
A method and system for surely and conveniently generating plasma in a narrow tube having a small diameter.A first electrode formed by a conductive member covered with an insulator or dielectric is inserted into a narrow tube. The narrow tube is located on a second electrode. A power supply applies an alternating voltage or pulse voltage between the first electrode and the second electrode so that plasma is generated in the narrow tube around the first electrode.
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中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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