Dongguan Shatou Asahi Metal Electronic Parts Co.; Ltd.
发明人:
KIN MAN LAI
申请号：
US15411390
公开号：
US20170226629A1
申请日:
2017.01.20
申请国别(地区):
US
年份:
2017
代理人:
摘要：
Disclosed is method for plating a PVD (physical vapor deposition) germ killing film, employing a vacuum magnetron sputtering technology and using a nano-silver-containing target for uniformly distributing nano-silver to form a germ killing film. The method can achieve the aim of full germ killing. Besides, nano-silver is enveloped in the sputtering target to form the film, so the target material target can play the role of protecting the nano-silver. Target material can be Al, Cr, stainless steel and Cu. Therefore, the nano-silver is protected； wear resistance of the germ killing film is increased； and the germ killing film can continuously kills germs for a long time.
