TERRENCE S. MCGRATH,DEIDRE SEWELL,DANIEL M. STOREY
申请号：
US15181651
公开号：
US20160287760A1
申请日:
2016.06.14
申请国别(地区):
US
年份:
2016
代理人:
摘要：
The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
