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ガス処理装置
专利权人:
株式会社NBCメッシュテック
发明人:
松本 貴紀,中山 鶴雄
申请号:
JP2014073931
公开号:
JP6373035B2
申请日:
2014.03.31
申请国别(地区):
JP
年份:
2018
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a gas treatment device that has high treatment efficiency by increasing the chance of contact of a filter with a catalyst in a limited space.SOLUTION: A gas treatment device comprises a first electrode, a second electrode that faces the first electrode, and dielectrics that cover opposing surfaces of the first and second electrodes, respectively, and further comprises a plasma generation part that generates plasma between both the electrodes, a meandering passage that is formed between both the electrodes and through which a gas to be treated introduced between both the electrodes flows, and a catalyst body that is arranged inside the passage and to which a catalyst for promoting the decomposition reaction of the gas to be treated is fixed.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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