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Multi-beam source
专利权人:
Elmar Platzgummer
发明人:
Elmar Platzgummer
申请号:
US12178153
公开号:
US08183543B2
申请日:
2008.07.23
申请国别(地区):
US
年份:
2012
代理人:
摘要:
A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.
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http://www.ckcest.cn/home/
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