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COSMETIC FOR HAIR STYLING
专利权人:
SHISEIDO CO.; LTD.
发明人:
SHIMIZU, HIDEKI,清水秀树,清水秀樹,KURASHIMA, TAKUMI,仓岛巧,倉島巧
申请号:
TW099111918
公开号:
TWI386230B
申请日:
2010.04.16
申请国别(地区):
TW
年份:
2013
代理人:
摘要:
Disclosed is a cosmetic for hair styling, which is easy to spread and fuse to hair, and due to the viscosity increased immediately after spreading, high hair styling ability is obtained, and after hair styling finished, all solvent is evaporated and the hair styling component separated out, so as to give a suitable setting force and restyling capability, while showing no stickiness. The cosmetic for hair styling of this invention contains the following (a) and (b) components:(a) a block type alkylene oxide derivatives (one or more compounds selected from formula (I), (II), (III)), which is solid under room temperature (25 ℃), and insoluble in water but transparently soluble in lower alcohols,R1O-[(AO)p(EO)q(AO)r]-R2 (I)R1O-[(EO)p(AO)q(EO)r]-R2 (II)R1O-[(EO)p(AO)qR3(AO)s(EO)r]-R2 (III)(wherein, AO is a C3-4 oxyalkylene group, EO is an oxyethylene group, p, q, r and s are average adduct mole numbers, 1≦p+r≦90, 1≦q+s≦90 and relatives to the sum of the C3-4 oxyalkylene group and oxyethylene group, the ratio of the oxyethylene group is 20 to 80 mass % R1and R2may the same or different, represent a C1-4 hydrocarbon group or a hydrogen atom, R3is a linear or branched C1-36 hydrocarbon group),(b) a solvent contains water and lower alcoholin which, component (a) is soluble in component (b), and after spreading the lower alcohol is evaporated firstly, component (a) then experienced a mixing state in the solvent with a changed composition, and the whole solvent evaporated substantially thereafter.本發明提供一種整髮用化粧料,係容易塗佈且與毛髮之融合度佳,由於塗佈後立即增黏而具有高的整髮力,並且因在整髮結束時使所有溶媒揮發並析出整髮成分,而賦予適度之定型力與再整髮性,同時不會沾黏。本發明之整髮用化粧料之特徵係包含下述(a)與(b)成分:(a)常溫(25℃)下為固體,不溶於水卻可透明地溶於低級醇之嵌段型環氧烷衍生物(選自(I)、(II)、(III)式中之1種或2種以上的化合物)R1O-[(AO)p(EO)q(AO)r]-R2 (I)R1O-[(EO)p(AO)q(EO)r]-R2 (II)R1O-[(EO)p(AO)qR3(AO)s(EO)r]-R2 (III)(式中,AO為碳原子數3至4之氧伸烷基,EO為氧伸乙基,p、q、r、s為平均加成莫耳數,1≦p+r≦90、1≦q+s≦90;相對於碳原子數3至4之氧伸烷基與氧伸乙基之總和,氧伸乙基之比例為20至80質量%;R1以及R2可為相同或相異的碳原子數1至4之烴基或氫原子,R3為碳原子數1至36之直鏈或分支的烴基);(b)含有水及低級醇之溶媒;而(a)成分係溶解於(b)成分者,並且,在塗佈後,隨著低級醇之優先揮發
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