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Topical Applicator Composition and Process for Treatment of Radiologically Contaminated Dermal Injuries
专利权人:
Tatiana G. Levitskaia
发明人:
Tatiana G. Levitskaia,Karla D. Thrall,James M. Peterson,Glen E. Fryxell,Charles A. Timchalk,Barbara J. Tarasevich
申请号:
US13173262
公开号:
US20140249102A1
申请日:
2011.06.30
申请国别(地区):
US
年份:
2014
代理人:
摘要:
A topical applicator composition and process are described that decorporate radionuclides from radiologically-contaminated dermal surfaces and that further promote healing. The topical applicator includes a decorporation agent mixed with a plasticizing agent that forms a covering when applied to the dermal surface that decorporates radionuclides and minimizes their systemic migration. The topical applicator formulations can be delivered in conjunction with bandages and other application dressings.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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