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Akt activity inhibitors
专利权人:
GLAXOSMITHKLINE LLC
发明人:
SEEFELD, MARK ANDREW,ROUSE, MEAGAN B.
申请号:
ES08729255
公开号:
ES2543325T3
申请日:
2008.02.07
申请国别(地区):
ES
年份:
2015
代理人:
摘要:
A compound of formula (I): ** Formula ** wherein: R8 and R9 are independently selected from: hydrogen, halogen, C1-4 alkyl, furan and thiophene; R6 is C1-4 alkyl; R7 is selected from hydrogen, C1-4 alkyl and halogen; R10 is selected from: - (CR60R61) m C5-C12 aryl where C5-C12 aryl is not substituted, and - (CR60R61) C5-C12 aryl where C5-C12 aryl is substituted by one to five substituents selected from among the group consisting of: -CO2R20, C1-4 alkyl, hydroxy C1-C4 alkyl, C1-C4oxy alkyl, amino, C1-C4 alkyl, aminoC1-C4 alkyl, C1-C4amino dialkyl, hydroxy, nitro, tetrazole, cyano, oxo, halogen and trifluoromethyl, where R20 is selected from hydrogen, C1-C4 alkyl and trifluoromethyl; where m is 0 to 2; and R60 and R61 are independently selected from: hydrogen and C1-4 alkyl; R11 is selected from hydrogen and C1-4 alkyl; X is selected from O, S and NR49, where R49 is selected from hydrogen and C1-4 alkyl; wherein aryl is a monocyclic, bicyclic or tricyclic ring system where at least one ring system is aromatic and wherein each ring system contains 3 to 7 links, and C1-4 alkyl is a linear or branched hydrocarbon chain that it is saturated or unsaturated, or one of its pharmaceutically acceptable salts.Un compuesto de fórmula (I):**Fórmula** en donde: R8 y R9 se seleccionan independientemente de: hidrógeno, halógeno, alquilo C1-4, furano y tiofeno; R6 es alquilo C1-4; R7 se selecciona de hidrógeno, alquilo C1-4 y halógeno; R10 se selecciona de: -(CR60R61)m arilo C5-C12 en donde arilo C5-C12 no está sustituido, y -(CR60R61)m arilo C5- C12 en donde el arilo C5-C12 está sustituido por uno a cinco sustituyentes seleccionado de entre el grupo consistente en:-CO2R20, alquilo C1-4, hidroxialquilo C1-C4, alquil C1-C4oxi, amino, alquil C1-C4amino, aminoalquilC1-C4, dialquil C1-C4amino, hidroxi, nitro, tetrazol, ciano, oxo, halógeno y trifluorometilo, donde R20 se selecciona de hidrógeno, alquilo C1-C4 y trifluorometilo; donde m es 0 a 2; y R60 y R61 se seleccionan independienteme
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中国工程科技知识中心
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