PROBLEM TO BE SOLVED: To provide an absorptive resin particles for cosmetic having excellent liquid dropping easiness, or smoothness when applied to skin, and quick-drying property after application.SOLUTION: An absorptive resin particle (X) for cosmetic having a volume average particle diameter of 1 to 50 μm contains a polymer (A) that has an ethylenically unsaturated monomer (a1) below and/or an ethylenically unsaturated monomer (a2) below, and an ethylenically unsaturated monomer (a3) below as essential constitutional units, the polymer (A) satisfies the following requirement (1), the absorptive resin particles (X) satisfies the following requirement (2). The ethylenically unsaturated monomer (a1): an ethylenically unsaturated monomer having at least one type of anionic group selected from the group consisting of a carboxyl group, a sulfo group and a phosphate group. The ethylenically unsaturated monomer (a2): a salt of (a1), alkali metal and/or onium cation. The ethylenically unsaturated monomer (a3): a salt of (a1) and at least divalent metal ions (b).SELECTED DRAWING: NoneCOPYRIGHT: (C)2017,JPO&INPIT【課題】皮膚に塗布したときの液切れの良さやなめらかさ及び塗布後の速乾性が優れた化粧料用吸収性樹脂粒子を提供する。【解決手段】下記エチレン性不飽和モノマー(a1)及び/又は下記エチレン性不飽和モノマー(a2)並びに下記エチレン性不飽和モノマー(a3)を必須構成単位とする重合体(A)を含有する吸収性樹脂粒子(X)であって、重合体(A)が下記要件(1)を満足し、吸収性樹脂粒子(X)が下記要件(2)を満足する体積平均粒子径が1~50μmである化粧料用吸収性樹脂粒子。 エチレン性不飽和モノマー(a1):カルボキシル基、スルホ基及びリン酸基からなる群から選ばれる少なくとも1種のアニオン基を有するエチレン性不飽和モノマー。エチレン性不飽和モノマー(a2):(a1)とアルカリ金属及び/又はオニウムのカチオンとの塩。エチレン性不飽和モノマー(a3):(a1)と2価以上の金属イオン(b)との塩。【選択図】 なし
