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Device and method for material processing by means of laser radiation
专利权人:
Mark Bischoff
发明人:
Mark Bischoff,Dirk Muehlhoff,Gregor Stobrawa
申请号:
US11786421
公开号:
US08553735B2
申请日:
2007.04.11
申请国别(地区):
US
年份:
2013
代理人:
摘要:
In a device for material processing by means of laser radiation, said device comprising a source of laser radiation emitting pulsed laser radiation for interaction with the material optics focusing the pulsed processing laser radiation to a center of interaction in the material a scanning unit shifting the positions of the center of interaction within the material, wherein each processing laser pulse interacts with the material in a zone surrounding the center of interaction assigned to said laser pulse so that material is separated in the zones of interaction and a control unit which controls the scanning unit and the source of laser radiation such that a cut surface is produced in the material by sequential arrangement of zones of interaction, it is envisaged that the control unit controls the source of laser radiation and the scanning unit such that adjacent centers of interaction are located at a spatial distance a ≦10 μm from each other.
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中国工程科技知识中心
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