The invention provides a device for coating nano particles on substrate and its manufacturing method comprising: providing at least one material feeding stick in a plasma processing device electrifying the plasma processing device and introducing a gas for cold plasma processing so that the plasma generated inside the plasma processing device impacts the material feeding stick to release a plurality of nano particles and, spraying the mixture containing plasma and the nano particles from an outlet of the plasma processing device onto a substrate. The mixture may perform the modification, film coating, sterilizing or toxicity measurement for the substrate, wherein the coating operation is not be restricted by the state property (i.e. solid, liquid, gas as three state) of the substrate and can be performed under the environment of normal temperature and normal pressure without restricting at vacuum environment and adapting associated facility required for vacuum environment.本發明為一種塗佈奈米微粒於基材的設備及其製造方法,其係提供至少一供料棒於一電漿加工裝置內,並對電漿加工裝置通電以及導入一氣體以進行冷電漿加工。使電漿加工裝置內部產生之電漿衝擊供料棒而釋放複數奈米微粒,再藉由電漿加工裝置之一出料口噴出具有電漿以及該些奈米微粒之混合物於一基材上,混合物係可對基材進行改質、鍍膜、消毒滅菌或毒性量測。其中塗佈作業係不受基材之態樣性質(即固、液、氣三態)而有所限制,同時塗佈作業可於常溫常壓環境下進行,毋須受限於真空環境以及適配真空環境所需之相關設施。S1‧‧‧步驟S2‧‧‧步驟S3‧‧‧步驟S4‧‧‧步驟
