Leonhard Trutwig,Mirko Hahnl,Karl-Otto Storck,Dirk Wandke,Matthias Kopp
申请号：
US15765573
公开号：
US20180295708A1
申请日:
2016.09.26
申请国别(地区):
US
年份:
2018
代理人:
摘要：
The invention relates to an electrode array for a dielectrically impeded plasma treatment of a surface of an electrically conductive body used as a counter electrode, comprising a flexible planar electrode (1) and a dielectric (2) of a planar flexible material, which by way of a layer (3) preventing a direct current flow shields the electrode (1) from the surface to be treated. By way of a structure having projections, the dielectric (2) can rest upon the surface to be treated, wherein air spaces for forming the plasma are formed in between the projections. The producibility in particular is improved in that the structure is a lattice structure (6) of adjoining walls (7, 8) that limit a plurality of chambers (9) forming the air spaces, and in that the chambers (9) have a bottom-side closure through the layer (3) of the dielectric (2) preventing the direct current flow and have a face that is open to the surface to be treated, the contact surface of which face consists of end edges (10) of the walls (7, 8) of the lattice structure (6) on the surface to be treated.
