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System for evaluating skin treatment
专利权人:
发明人:
Basil M. Hantash
申请号:
US14255706
公开号:
US09554746B1
申请日:
2014.04.17
申请国别(地区):
US
年份:
2017
代理人:
摘要:
A system allows determining treatment parameters or sets of parameters applicable to electromagnetic radiation (EMR)-based device skin treatments that allow for upregulation of the sirtuin family of genes post treatment, while avoiding increasing collagen production. The system can be applied to other skin procedures, including chemical treatments, microdermabrasion treatments and others. The system includes classifying patient data into classifications of skin treatment and treatment parameters based on patient baseline levels. The system can determine effective treatment parameters for patients on an individual basis, to yield a healthy wound dealing response. In a specific implementation, the system determines the parameters of EMR and chemical based treatments that increase sirtuin gene expression post treatment, but do not induce collagen production.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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