您的位置: 首页 > 农业专利 > 详情页

GELLING REDUCTION TOOL FOR GROOVING CHEMICAL MECHANICAL PLANARIZATION POLISHING PADS
专利权人:
Rohm and Haas Electronic Materials CMP Holdings, Inc.
发明人:
Delaney Patrick S.,Stack Jeffrey Robert,Cantrell Brian T.
申请号:
US201715476286
公开号:
US2018281076(A1)
申请日:
2017.03.31
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
The present invention provides a grooving tool for machining the surface of a polymeric foam article, such as a chemical mechanical (CMP) polishing pad, the grooving tool comprising a flat bed platen on which the article sits, a grooving tool frame having a front face positioned parallel to and facing the flat surface of the polymeric foam article on which front face is contained one or more cutting tool teeth arranged in a predetermined direction and with a constant pitch. Each cutting tool tooth has a non-cutting shoulder where it joins the grooving tool frame (i) a groove cutting face that forms a rake angle ranging from 2° to 80°, (ii) a chip ejection face located on the top of the tooth between the non-cutting shoulder and the groove cutting face and (iv) a shouldering radius transitioning from the cutting tool tooth to the non-cutting shoulder.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充