SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.;SHANGHAI UNITED IMAGING INTELLIGENCE CO., LTD.
发明人:
Dijia WU,Yongqin XIAO
申请号：
US16729401
公开号：
US20200205766A1
申请日:
2019.12.29
申请国别(地区):
US
年份:
2020
代理人:
摘要：
A method for exposure controlling in medical device may include obtaining one or more exposure parameters relating to an exposure process associated with an object performed by a radiation device. The method may also include obtaining object information relating to the object. The method may also include determining an exposure moment based on the object information. The method may also include causing the radiation device to perform the exposure process to the object based on the one or more exposure parameters and the exposure moment.
