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DEVICE FOR MONITORING AN ELECTRON BEAM VIA AN ELECTRICAL SENSOR WITH MULTIPLE CONDUCTORS
专利权人:
发明人:
申请号:
EP13805799.7
公开号:
EP2925664A2
申请日:
2013.11.29
申请国别(地区):
EP
年份:
2015
代理人:
摘要:
The present invention relates to an irradiation device (36) for irradiating packaging containers (12) with electron beams in a filling machine. The irradiation device (36) comprises at least one electron beam emitter (10) and at least one sensor device (56) for measuring at least one dose control parameters of the electron beam. The sensor device (56) is arranged to measure said dose control parameter of the electron beam of said electron beam emitter (10) in between packaging container irradiation cycles. The invention also relates to a method.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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