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Phototherapy apparatus using excimer radiation
专利权人:
Taku Sumitomo
发明人:
Taku Sumitomo,Tatumi Hiramoto,Akimichi Morita
申请号:
US11610130
公开号:
US08540757B2
申请日:
2006.12.13
申请国别(地区):
US
年份:
2013
代理人:
摘要:
A phototherapy device using excimer radiation in which, by skillful use of the individual peak wavelength of 308 nm and of the emission range of shorter wavelengths than 308 nm, the therapy effect is enhanced, and in which, at the same time, harm can be reduced is achieved using a XeCl excimer lamp and in which diseased sites of skin disorders are irradiated with UV-B radiation with an optical filter being used for changing the spectral shape of the UV-B radiation with which the diseased sites are irradiated.
来源网站:
中国工程科技知识中心
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