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METHODS OF MANUFACTURING TARGET FOR GENERATING CHARGED PARTICLES, TARGET STRUCTURES, AND TREATMENT APPARATUSES INCLUDING THE TARGET STRUCTURES
专利权人:
Electronics and Telecommunications Research
发明人:
Hyung Ju PARK,Hyeon-Bong PYO,Seong-Mok CHO,Moon Youn JUNG,Seunghwan KIM
申请号:
US13687177
公开号:
US20130158632A1
申请日:
2012.11.28
申请国别(地区):
US
年份:
2013
代理人:
摘要:
Provided are a method of manufacturing a target for generating charged particles, a target structure, and a treatment apparatus including the target structure. The method includes forming a source layer on a substrate, forming balls on the source layer, forming a metal thin layer on the source layer exposed between the balls, and removing the balls to form holes in the metal thin layer so as to expose the source layer.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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