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Radiation source
专利权人:
Vadim Yevgenyevich Banine
发明人:
Vadim Yevgenyevich Banine,Vladimir Vitalevich Ivanov
申请号:
US12818621
公开号:
US08242473B2
申请日:
2010.06.18
申请国别(地区):
US
年份:
2012
代理人:
摘要:
A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with the substance at the interaction point, and a conduit constructed and arranged to deliver unheated buffer gas into the chamber at a location adjacent to the interaction point at a rate that removes heated buffer gas from a region around the interaction point before a subsequent interaction between the laser beam and the substance at the interaction point.
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