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APPARATUS FOR ODOR REDUCTION USING PYROLYSIS
专利权人:
PARK, SEUNG RIM;LEE, JAE SIG;박승림;이재식
发明人:
박승림,이재식,PARK, SEUNG RIMKR,LEE, JAE SIGKR
申请号:
KR1020200008647
公开号:
KR1021192190000B1
申请日:
2020.01.22
申请国别(地区):
KR
年份:
2020
代理人:
摘要:
Disclosed is an apparatus for reducing odor using thermal decomposition according to an embodiment of the present invention. The odor reduction device includes a porous first earthenware chamber in which an intake port and an exhaust port are disposed, and a second porous earth chamber disposed inside the first earthenware chamber, wherein the second earthenware chamber is the first earthenware chamber. A space between the inner surface of the chamber and the outer surface of the second porcelain chamber is used to preheat the odor gas introduced into the intake port, and is disposed inside the second porcelain chamber and is a first pyrolysis unit formed of a cylindrical porous porcelain. , It is disposed inside the first thermal decomposition unit, the second thermal decomposition unit formed of a cylindrical porous ceramic, the inner wall of the first thermal decomposition unit and the outer wall of the second thermal decomposition unit is compressed between the inner wall of the first thermal decomposition unit and the agent 2 A first heat generating unit that transfers heat to the outer wall of the thermal decomposition unit, a discharge pipe connected between the inside of the second ceramic chamber and the exhaust port so that clean gas generated from the odor gas by thermal decomposition is discharged to the exhaust port, the second A temperature sensor disposed inside the pottery chamber to measure the temperature inside the second pottery chamber, and based on the temperature measured by the temperature sensor, the inner temperature of the second pottery chamber is 500 C to 700 It may include a control unit for controlling the first heat generating unit to be maintained in C. Here, the lower portion of the first thermal decomposition unit and the lower portion of the second thermal decomposition unit are fixed to the lower surface of the second porcelain chamber, and the lower portion of the first thermal decomposition unit has the preheated odor gas int
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