A spinal implant has a proximal region and a distal region, and includes an upper body and a lower body each having inner surfaces disposed in opposed relation relative to each other. A proximal adjustment assembly is disposed between the upper and lower bodies at the proximal region of the spinal implant and is adjustably coupled to the upper and lower bodies, and a distal adjustment assembly is disposed between the upper and lower bodies at the distal region of the spinal implant and is adjustably coupled to the upper and lower bodies. The proximal and distal adjustment assemblies are independently movable with respect to each other to change a vertical height of at least one of the proximal region or the distal region of the spinal implant.
