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SKIN ENHANCING COMPOSITIONS AND METHODS
专利权人:
Sytheon Limited
发明人:
Ratan K. Chaudhuri
申请号:
US15798804
公开号:
US20180116927A1
申请日:
2017.10.31
申请国别(地区):
US
年份:
2018
代理人:
摘要:
The present invention relates to compositions and methods for treating and/or preventing chronic- or UV-induced photodamage in the skin as well as damage to the skin caused by chronological aging and disease. Specifically, select aryl alkanones have been found to induce/produce a number of beneficial effects in the skin and skin processes by elevating the skin's defense against UV-induced damage and reversing skin photo- and/or chronological damage in the extracellular matrix (ECM) and dermal-epidermal junction (DEJ), up-regulating tissue inhibitory metalloproteases, reducing oxidative stress, inhibiting activity of matrix metalloproteases, and protecting DNA.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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